Fundamentals of semiconductor fabrication / Gary S. May
Material type: TextPublication details: John Wiley & Sons, New Jersey : 2004Description: xiii, 305 pISBN:- 981253072x (pbk)
- 621.38152 M4514
Contents:
1. Introduction
2. Crystal Growth
3. Silicon oxidation
4. Photolithography
5. Etching
6. Diffusion
7. Ion implantation
8. Film deposition
9. Process integration
10. IC manufacturing
11. Future trends and challenges
Item type | Current library | Call number | Status | Date due | Barcode |
---|---|---|---|---|---|
Books | UE-Central Library | 621.38152 M4514 (Browse shelf(Opens below)) | Available | T285 |
Browsing UE-Central Library shelves Close shelf browser (Hides shelf browser)
621.38152 D594 Principles of semiconductor devices | 621.38152 D594 Understanding semiconductor devices | 621.38152 G651 Semiconductor device technology | 621.38152 M4514 Fundamentals of semiconductor fabrication | 621.38152 M6875 Semiconductor device physics and design | 621.38152 Oh6 Materials science of thin films | 621.38152 R759 An introduction to the physics of semiconductor devices |
IncludesAppendices and index
1. Introduction
2. Crystal Growth
3. Silicon oxidation
4. Photolithography
5. Etching
6. Diffusion
7. Ion implantation
8. Film deposition
9. Process integration
10. IC manufacturing
11. Future trends and challenges
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