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Fundamentals of semiconductor fabrication (Record no. 2135)

MARC details
000 -LEADER
fixed length control field 00819nam a2200217Ia 4500
001 - CONTROL NUMBER
control field 285
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20201023093626.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 180716s9999||||xx |||||||||||||| ||und||
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 981253072x (pbk)
040 ## - CATALOGING SOURCE
Transcribing agency PK-IsLIS
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.38152
Item number M4514
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name May, Gary S.
245 #0 - TITLE STATEMENT
Title Fundamentals of semiconductor fabrication
Statement of responsibility, etc / Gary S. May
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Name of publisher, distributor, etc John Wiley & Sons,
Place of publication, distribution, etc New Jersey :
Date of publication, distribution, etc 2004
300 ## - PHYSICAL DESCRIPTION
Extent xiii, 305 p.
500 ## - GENERAL NOTE
General note IncludesAppendices and index
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Applied Physics-Technology
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name Simon M. Sze
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Books
505 0# - FORMATTED CONTENTS NOTE
Formatted contents note 1. Introduction <br/>2. Crystal Growth <br/>3. Silicon oxidation <br/>4. Photolithography <br/>5. Etching <br/>6. Diffusion<br/>7. Ion implantation <br/>8. Film deposition <br/>9. Process integration <br/>10. IC manufacturing <br/>11. Future trends and challenges <br/><br/>
Holdings
Withdrawn status Damaged status Not for loan Home library Current library Date acquired Full call number Barcode Date last seen Price effective from Koha item type
      UE-Central Library UE-Central Library 16.07.2018 621.38152 M4514 T285 16.07.2018 16.07.2018 Books
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