Fundamentals of semiconductor fabrication / Gary S. May
Material type: TextPublication details: John Wiley & Sons, New Jersey : 2004Description: xiii, 305 pISBN:- 981253072x (pbk)
- 621.38152 M4514
Contents:
1. Introduction
2. Crystal Growth
3. Silicon oxidation
4. Photolithography
5. Etching
6. Diffusion
7. Ion implantation
8. Film deposition
9. Process integration
10. IC manufacturing
11. Future trends and challenges
Item type | Current library | Call number | Status | Date due | Barcode |
---|---|---|---|---|---|
Books | UE-Central Library | 621.38152 M4514 (Browse shelf(Opens below)) | Available | T285 |
IncludesAppendices and index
1. Introduction
2. Crystal Growth
3. Silicon oxidation
4. Photolithography
5. Etching
6. Diffusion
7. Ion implantation
8. Film deposition
9. Process integration
10. IC manufacturing
11. Future trends and challenges
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