000			02288nam a22001697a 4500
999			_c21815 _d21815
005			20221005180716.0
008			221005b ||||| |||| 00| 0 eng d
020			_ahbk
082			_a530.12 _bSy78
100			_aWaqar Ahmad, _bMS Physics, _c2016-2018 _dSupervised by Dr. Ali Hussain
245			_aSynthesis and characterizations of tungsten nitride thin films on zirconium substrate by using plasma focus device _c/ Waqar Ahmad
260			_aLahore : _bDivision of Science & Technology, University of Education, _c2018
300			_axii, 71 p. _eCD
520			_aTungstun Nitride thin film is synthesized on zirconium substrate with the assistance of Mather-type plasma focus framework at the room temperature. So as to deposit the hard coatings on various substrates, the gadget was charged at 18KV.The surface properties of exposed substrates were resolved for structure of the crystals, surface morphology and mechanical properties with the assistance of the surface properties of the exposed substrate against various statement shots were analyzed for structure of the crystal, surface morphology and mechanical properties utilizing X-Ray diffraction (XRD), atomic force microscopy, examining electron magnifying instrument. The XRD results demonstrate the schematic development of WN, WN2, Zr2N and W2Zr phases and the improvement of stored films by shifting the quantity of deposition shots. The Morphology of stored films demonstrates the critical change with various particle energy doses (number of testimony shots) in the surface structure. Because of the impact of various particle energy doses, atomic force microscopy explored the Film harshness and that uncovered impact of variety in plasma focus shots around surface unpleasantness which is observed to be expanded with increment in plasma focus shots prompts an enhancement of hardness of deposit films. The focusing efficiency is depended on working gas pressures and it is discovered that for higher (1.25 mbar) weight, great focus is accomplished, relatively bringing about the emanation of higher energetic particles. The synthesized thin films demonstrate the grain measure is firmly affected by expanding in focus shots.
650			_aPhysics--Characterizations--Thin Films--Plasma
942			_cTH