Shriyar Tariq,  MS Physics,  2016-2018  Supervised by Dr. Ali Hussnain <br/><br/>
Study of structural and morphological properties of tungsten nitride thin film prepared using plasma focus device 
/ Shriyar Tariq 
 - Lahore :  Division of Science & Technology, University of Education,  2018 
 - xi, 85 p.   CD 
<br/><br/> The significance of this research is to perfect the technique of producing fine tungsten<br/>Nano film on silicon substrate. That will be used as diffusion barriers in integrated<br/>circuits capable of handling higher temperature without intermixing of Si and Cu. This<br/>will greatly enhance the life and working temperature range of IC’s. Nano films of<br/>tungsten nitride are formed using a Mather type dense plasma focus device on the silicon<br/>substrate and varied number of shots. Different number of shots i.e. 10, 20, 30 and 40 are<br/>employed and the effect of this variation in number of shots on crystalline arrangement<br/>and crystalline shape is studied. The XRD data of the irradiated substrate indicated the<br/>presence of different phases of WN and WN2, the number of shots determine that which<br/>phase will be dominant. The SEM micrographs revealed a uniform distribution of grains<br/>all over the substrate. 
<br/><br/><label>ISBN: </label>hbk 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Physics--Morphological Properties--Thin Film
<br/><br/><label>Dewey Class. No.: </label>537.5  / St9468