Study of structural and morphological properties of tungsten nitride thin film prepared using plasma focus device (Record no. 21823)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01548nam a22001697a 4500 |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20221005185714.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 221005b ||||| |||| 00| 0 eng d |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | hbk |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 537.5 |
| Item number | St9468 |
| 100 ## - MAIN ENTRY--PERSONAL NAME | |
| Student name | Shriyar Tariq, |
| Class | MS Physics, |
| Session | 2016-2018 |
| Supervisor | Supervised by Dr. Ali Hussnain |
| 245 ## - TITLE STATEMENT | |
| Title | Study of structural and morphological properties of tungsten nitride thin film prepared using plasma focus device |
| Statement of responsibility, etc | / Shriyar Tariq |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
| Place of publication, distribution, etc | Lahore : |
| Name of publisher, distributor, etc | Division of Science & Technology, University of Education, |
| Date of publication, distribution, etc | 2018 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | xi, 85 p. |
| Accompanying material | CD |
| 520 ## - SUMMARY, ETC. | |
| Summary, etc | The significance of this research is to perfect the technique of producing fine tungsten<br/>Nano film on silicon substrate. That will be used as diffusion barriers in integrated<br/>circuits capable of handling higher temperature without intermixing of Si and Cu. This<br/>will greatly enhance the life and working temperature range of IC’s. Nano films of<br/>tungsten nitride are formed using a Mather type dense plasma focus device on the silicon<br/>substrate and varied number of shots. Different number of shots i.e. 10, 20, 30 and 40 are<br/>employed and the effect of this variation in number of shots on crystalline arrangement<br/>and crystalline shape is studied. The XRD data of the irradiated substrate indicated the<br/>presence of different phases of WN and WN2, the number of shots determine that which<br/>phase will be dominant. The SEM micrographs revealed a uniform distribution of grains<br/>all over the substrate. |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name as entry element | Physics--Morphological Properties--Thin Film |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | Theses |
| Withdrawn status | Damaged status | Home library | Current library | Date acquired | Full call number | Barcode | Date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|
| UE-Central Library | UE-Central Library | 05.10.2022 | 537.5 St9468 | TTH144 | 05.10.2022 | 05.10.2022 | Theses |
