Synthesis and characterizations of tungsten nitride thin films on zirconium substrate by using plasma focus device (Record no. 21815)
[ view plain ]
| 000 -LEADER | |
|---|---|
| fixed length control field | 02288nam a22001697a 4500 |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20221005180716.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 221005b ||||| |||| 00| 0 eng d |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | hbk |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 530.12 |
| Item number | Sy78 |
| 100 ## - MAIN ENTRY--PERSONAL NAME | |
| Student name | Waqar Ahmad, |
| Class | MS Physics, |
| Session | 2016-2018 |
| Supervisor | Supervised by Dr. Ali Hussain |
| 245 ## - TITLE STATEMENT | |
| Title | Synthesis and characterizations of tungsten nitride thin films on zirconium substrate by using plasma focus device |
| Statement of responsibility, etc | / Waqar Ahmad |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
| Place of publication, distribution, etc | Lahore : |
| Name of publisher, distributor, etc | Division of Science & Technology, University of Education, |
| Date of publication, distribution, etc | 2018 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | xii, 71 p. |
| Accompanying material | CD |
| 520 ## - SUMMARY, ETC. | |
| Summary, etc | Tungstun Nitride thin film is synthesized on zirconium substrate with the assistance of<br/>Mather-type plasma focus framework at the room temperature. So as to deposit the<br/>hard coatings on various substrates, the gadget was charged at 18KV.The surface<br/>properties of exposed substrates were resolved for structure of the crystals, surface<br/>morphology and mechanical properties with the assistance of the surface properties of<br/>the exposed substrate against various statement shots were analyzed for structure of<br/>the crystal, surface morphology and mechanical properties utilizing X-Ray diffraction<br/>(XRD), atomic force microscopy, examining electron magnifying instrument. The<br/>XRD results demonstrate the schematic development of WN, WN2, Zr2N and W2Zr<br/>phases and the improvement of stored films by shifting the quantity of deposition<br/>shots.<br/>The Morphology of stored films demonstrates the critical change with various particle<br/>energy doses (number of testimony shots) in the surface structure. Because of the<br/>impact of various particle energy doses, atomic force microscopy explored the Film<br/>harshness and that uncovered impact of variety in plasma focus shots around surface<br/>unpleasantness which is observed to be expanded with increment in plasma focus<br/>shots prompts an enhancement of hardness of deposit films. The focusing efficiency is<br/>depended on working gas pressures and it is discovered that for higher (1.25 mbar)<br/>weight, great focus is accomplished, relatively bringing about the emanation of higher<br/>energetic particles. The synthesized thin films demonstrate the grain measure is firmly<br/>affected by expanding in focus shots. |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name as entry element | Physics--Characterizations--Thin Films--Plasma |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | Theses |
| Withdrawn status | Damaged status | Home library | Current library | Date acquired | Full call number | Barcode | Date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|
| UE-Central Library | UE-Central Library | 05.10.2022 | 530.12 Sy78 | TTH134 | 05.10.2022 | 05.10.2022 | Theses |
