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Mechanical properties of tungsten nitride using plasa focus device (Record no. 21779)

MARC details
000 -LEADER
fixed length control field 02297nam a22001697a 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20220928150050.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 220923b ||||| |||| 00| 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number hbk
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 531.1
Item number M4644
100 ## - MAIN ENTRY--PERSONAL NAME
Student name Hamza Younis Chadhar,
Class BS (Hons Physics),
Session 2014-2018,
Supervisor Supervised by Dr. Ali Hussnain
245 ## - TITLE STATEMENT
Title Mechanical properties of tungsten nitride using plasa focus device
Statement of responsibility, etc / Hamza Younis Chadhar
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication, distribution, etc Lahore :
Name of publisher, distributor, etc Division of Science & Technology, University of Education,
Date of publication, distribution, etc 2018
300 ## - PHYSICAL DESCRIPTION
Extent 51 p.
Accompanying material CD
520 ## - SUMMARY, ETC.
Summary, etc The thin films of nano-crystalline tungsten nitride were deposited on the stainless steel substrate at room temperature using Mather-type dense plasma focus device. Thin films on the substrate surface improve the mechanical properties of the material as well as electrical properties. The hard, wear protecting coatings are suitable candidates for the use of such materials in the Industrial usage as well as in some lab applications to enhance the performance of the materials. The improved surface properties are attracted the researchers. The substrate surface of stainless steel was exposed against different (10, 20 and 30) number of focus shots. Some changes are observed on the substrate surface when they came in contact with focus shots. The surface properties of the treated material were investigated by various techniques to check the surface morphology and structure. Structural properties, surface morphology and the mechanical properties of the exposed substrate surface are examined by using X-ray diffraction (XRD), scanning electron microscope (SEM) and nano-indenter. The XRD results indicate the presence of different phases of WN and WN2 on the substrate and the presence of strain and stress in the deposited thin films by changing the number of shots. Surface morphology of the deposited films revealed the prominent change in the surface morphology by changing the ion energy flux which are highly depend on the number of focus shots. The variation in the ion energy flux indicates the presence of strains and stress in the deposited thin films on the substrate surface which shows that the hardness of the substrate material enhanced significantly.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Mechanical Properties--Tungsten Nitride--Plasma
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Theses
Holdings
Withdrawn status Damaged status Home library Current library Date acquired Full call number Barcode Date last seen Price effective from Koha item type
    UE-Central Library UE-Central Library 23.09.2022 531.1 M4644 TTH103 23.09.2022 23.09.2022 Theses
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