Mechanical properties of tungsten nitride using plasa focus device
Hamza Younis Chadhar, BS (Hons Physics), 2014-2018, Supervised by Dr. Ali Hussnain
Mechanical properties of tungsten nitride using plasa focus device / Hamza Younis Chadhar - Lahore : Division of Science & Technology, University of Education, 2018 - 51 p. CD
The thin films of nano-crystalline tungsten nitride were deposited on the stainless steel substrate at room temperature using Mather-type dense plasma focus device. Thin films on the substrate surface improve the mechanical properties of the material as well as electrical properties. The hard, wear protecting coatings are suitable candidates for the use of such materials in the Industrial usage as well as in some lab applications to enhance the performance of the materials. The improved surface properties are attracted the researchers. The substrate surface of stainless steel was exposed against different (10, 20 and 30) number of focus shots. Some changes are observed on the substrate surface when they came in contact with focus shots. The surface properties of the treated material were investigated by various techniques to check the surface morphology and structure. Structural properties, surface morphology and the mechanical properties of the exposed substrate surface are examined by using X-ray diffraction (XRD), scanning electron microscope (SEM) and nano-indenter. The XRD results indicate the presence of different phases of WN and WN2 on the substrate and the presence of strain and stress in the deposited thin films by changing the number of shots. Surface morphology of the deposited films revealed the prominent change in the surface morphology by changing the ion energy flux which are highly depend on the number of focus shots. The variation in the ion energy flux indicates the presence of strains and stress in the deposited thin films on the substrate surface which shows that the hardness of the substrate material enhanced significantly.
hbk
Mechanical Properties--Tungsten Nitride--Plasma
531.1 / M4644
Mechanical properties of tungsten nitride using plasa focus device / Hamza Younis Chadhar - Lahore : Division of Science & Technology, University of Education, 2018 - 51 p. CD
The thin films of nano-crystalline tungsten nitride were deposited on the stainless steel substrate at room temperature using Mather-type dense plasma focus device. Thin films on the substrate surface improve the mechanical properties of the material as well as electrical properties. The hard, wear protecting coatings are suitable candidates for the use of such materials in the Industrial usage as well as in some lab applications to enhance the performance of the materials. The improved surface properties are attracted the researchers. The substrate surface of stainless steel was exposed against different (10, 20 and 30) number of focus shots. Some changes are observed on the substrate surface when they came in contact with focus shots. The surface properties of the treated material were investigated by various techniques to check the surface morphology and structure. Structural properties, surface morphology and the mechanical properties of the exposed substrate surface are examined by using X-ray diffraction (XRD), scanning electron microscope (SEM) and nano-indenter. The XRD results indicate the presence of different phases of WN and WN2 on the substrate and the presence of strain and stress in the deposited thin films by changing the number of shots. Surface morphology of the deposited films revealed the prominent change in the surface morphology by changing the ion energy flux which are highly depend on the number of focus shots. The variation in the ion energy flux indicates the presence of strains and stress in the deposited thin films on the substrate surface which shows that the hardness of the substrate material enhanced significantly.
hbk
Mechanical Properties--Tungsten Nitride--Plasma
531.1 / M4644
