TY  - BOOK
TI  - Chemical vapour deposition : precursors, processes and applications
SN  - 9780854044658 (hbk)
U1  - 671.735 
PY  - 2009///
CY  - UK
PB  - RSC
KW  - Chemical vapor deposition--Chemistry--Vapor-plating
N1  - 1.	Overview of chemical vapour deposition 
2.	CVD reactors and delivery system technology 
3.	Modeling CVD processes
4.	Atomic layer deposition
5.	Basic chemistry of CVD and ALD precursors 
6.	CVD of III-V compound semiconductors 
7.	Chemical vapor deposition of metals: W, AI, Cu and Ru
8.	Chemical vapour deposition of metal oxides for microelectronics applications 
9.	Metal organic chemical vapour deposition of refractory transition metal nitrides 
10.	CVD of functional coatings on glass 
11.	Photo assisted CVD 
12.	Plasma enhanced chemical vapour deposition processes
13.	Commercial aspects of CVD

ER  -