Chemical vapour deposition : precursors, processes and applications 

 - UK :  RSC,  2009 
 - 582 p.  
<br/><br/>1.	Overview of chemical vapour deposition <br/>2.	CVD reactors and delivery system technology <br/>3.	Modeling CVD processes<br/>4.	Atomic layer deposition<br/>5.	Basic chemistry of CVD and ALD precursors <br/>6.	CVD of III-V compound semiconductors <br/>7.	Chemical vapor deposition of metals: W, AI, Cu and Ru<br/>8.	Chemical vapour deposition of metal oxides for microelectronics applications <br/>9.	Metal organic chemical vapour deposition of refractory transition metal nitrides <br/>10.	CVD of functional coatings on glass <br/>11.	Photo assisted CVD <br/>12.	Plasma enhanced chemical vapour deposition processes<br/>13.	Commercial aspects of CVD  <br/> 
<br/><br/><label>ISBN: </label>9780854044658 (hbk) 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Chemical vapor deposition--Chemistry--Vapor-plating
<br/><br/><label>Dewey Class. No.: </label>671.735  / C42012