May, Gary S. <br/><br/>
Fundamentals of semiconductor fabrication 
/ Gary S. May 
 - New Jersey :  John Wiley & Sons,  2004 
 - xiii, 305 p. 
<br/><br/> IncludesAppendices and index 
<br/><br/>1.	Introduction <br/>2.	Crystal Growth <br/>3.	Silicon oxidation <br/>4.	Photolithography <br/>5.	Etching <br/>6.	Diffusion<br/>7.	Ion implantation <br/>8.	Film deposition <br/>9.	Process integration <br/>10.	IC manufacturing <br/>11.	Future trends and challenges <br/><br/> 
<br/><br/><label>ISBN: </label>981253072x (pbk) 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Applied Physics-Technology
<br/><br/><label>Dewey Class. No.: </label>621.38152  / M4514