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Chemical vapour deposition : precursors, processes and applications

Material type: TextTextPublication details: UK : RSC, 2009Description: 582 pISBN:
  • 9780854044658 (hbk)
Subject(s): DDC classification:
  • 671.735 C42012
Contents:
1. Overview of chemical vapour deposition 2. CVD reactors and delivery system technology 3. Modeling CVD processes 4. Atomic layer deposition 5. Basic chemistry of CVD and ALD precursors 6. CVD of III-V compound semiconductors 7. Chemical vapor deposition of metals: W, AI, Cu and Ru 8. Chemical vapour deposition of metal oxides for microelectronics applications 9. Metal organic chemical vapour deposition of refractory transition metal nitrides 10. CVD of functional coatings on glass 11. Photo assisted CVD 12. Plasma enhanced chemical vapour deposition processes 13. Commercial aspects of CVD
List(s) this item appears in: New Arrival Fy 2021-22
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Item type Current library Call number Status Date due Barcode
Books Books UE-Central Library 671.735 C42012 (Browse shelf(Opens below)) Available T16817
Books Books UE-Central Library 671.735 C42012 (Browse shelf(Opens below)) Available T16818

1. Overview of chemical vapour deposition
2. CVD reactors and delivery system technology
3. Modeling CVD processes
4. Atomic layer deposition
5. Basic chemistry of CVD and ALD precursors
6. CVD of III-V compound semiconductors
7. Chemical vapor deposition of metals: W, AI, Cu and Ru
8. Chemical vapour deposition of metal oxides for microelectronics applications
9. Metal organic chemical vapour deposition of refractory transition metal nitrides
10. CVD of functional coatings on glass
11. Photo assisted CVD
12. Plasma enhanced chemical vapour deposition processes
13. Commercial aspects of CVD

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