Chemical vapour deposition : precursors, processes and applications
Material type: TextPublication details: UK : RSC, 2009Description: 582 pISBN:- 9780854044658 (hbk)
- 671.735 C42012
Item type | Current library | Call number | Status | Date due | Barcode |
---|---|---|---|---|---|
Books | UE-Central Library | 671.735 C42012 (Browse shelf(Opens below)) | Available | T16817 | |
Books | UE-Central Library | 671.735 C42012 (Browse shelf(Opens below)) | Available | T16818 |
1. Overview of chemical vapour deposition
2. CVD reactors and delivery system technology
3. Modeling CVD processes
4. Atomic layer deposition
5. Basic chemistry of CVD and ALD precursors
6. CVD of III-V compound semiconductors
7. Chemical vapor deposition of metals: W, AI, Cu and Ru
8. Chemical vapour deposition of metal oxides for microelectronics applications
9. Metal organic chemical vapour deposition of refractory transition metal nitrides
10. CVD of functional coatings on glass
11. Photo assisted CVD
12. Plasma enhanced chemical vapour deposition processes
13. Commercial aspects of CVD
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